 |
论文库 |
|
|
|
|
| 论文编号: |
2015-2012 |
| 作者: |
Di, Chengliang(1,2); Yan, Wei(2); Hu, Song(2); Yin, Didi(1,3); Ma, Chifei(1,2) |
| 刊物名称: |
IEEE Photonics Technology Letters |
| 所属学科: |
|
| 论文题目英文: |
Moiré-based absolute interferometry with large measurement range in wafer-mask alignment |
| 年: |
2015 |
| 卷: |
27 |
| 期: |
4 |
| 页: |
435-438 |
| 联系作者: |
|
| 收录类别: |
|
| 影响因子: |
|
| 参与作者: |
|
| 备注: |
|
|
|
|
|
