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论文库 |
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| 论文编号: |
2013-2017 |
| 作者: |
Fang, Liang(1); Pan, Li(1); Wang, Changtao(1); Luo, Xiangang(1) |
| 刊物名称: |
Microelectronic Engineering |
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| 论文题目英文: |
Superlens imaging lithography for high aspect ratio sub-wavelength pattern employing trilayer resist process |
| 年: |
2013 |
| 卷: |
110 |
| 期: |
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| 页: |
35-39 |
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